| http://www.w3.org/ns/prov#value | - fer peripheral edge so as to confine wafer movement during a polishing operation; the retainer body inner surface extending from the upper end to the lower end and including a first portion spanning at least a portion of the thickness of the wafer carrier and a second portion protruding beyond the wafer carrier for contact with the wafer peripheral edge; and the retainer body defining a recess ext
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