| http://www.w3.org/ns/prov#value | - After the resist is peeled off, it is rinsed with 2-propanol and the like, and further may be rinsed with water. [0063] (Patterning Methods) [0064] Patterning by a photolithography method used in the present invention is a method to pattern an organic EL layer and is concretely carried out as follows: [0065] When a positive photoresist is used, after an organic EL layer is formed on the whole surf
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