| http://www.w3.org/ns/prov#value | - After the substrate 230 is loaded into equipment, a frequency bandwidth of at least one of the first AC voltage 220 and the second AC voltage 250 is 300 KHz to 27.12 MHz and plasma is generated in the chamber 200, and the chalcogenide film is deposited on the substrate 230 through a method such as plasma enhanced chemical vapor deposition (PECVD), plasma enhanced atomic layer deposition (PEALD), r
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