| http://www.w3.org/ns/prov#value | - forming a second resist layer; exposing and developing the second resist layer to define a pattern in the second resist layer exposing portions of the interlayer dielectric, the pattern in the second resist layer including areas corresponding in size, shape and location to the second and third local interconnects; etching the interlayer dielectric and the passivation layer to create openings revea
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