PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • The other oxide film 805 of the film structure 806 is formed to a film thickness of for example 100 nm and provided as a gate oxide film on the basis that the polysilicon film 804 will be utilized as a buried electrode.
http://www.w3.org/ns/prov#wasQuotedFrom
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