About: http://webisa.webdatacommons.org/85913464

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Then, after removing the oxide film by etchant including hydrofluoric acid at the same time as washing the surface of the silicon film, an insulating film mainly including silicon to become a gate insulating film 13 is formed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com