| http://www.w3.org/ns/prov#value | - SUMMARY OF THE INVENTION [0007] The objects set forth above as well as further and other objects and advantages of the present invention are achieved by the embodiments of the invention described hereinbelow. [0008] A gas cluster ion beam processing apparatus treats a workpiece with a gas cluster ion beam to effect surface modification such as smoothing, etching, cleaning, deposition, etc.
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