| http://www.w3.org/ns/prov#value | - First masking material layer 435 is, for example, a photoresist such as used in the embodiment described above with reference to FIGS. 2-13(d) and the accompanying text deposited to a thickness of the desired height of the tip portion of a contact element taking into consideration the possibility of planarizing a portion of first masking material layer 435 with tip portion material.
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