About: http://webisa.webdatacommons.org/88018630

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	FIG. 4 is a conceptual drawing for describing the characteristic of a mask 60 employed for manufacturing a semiconductor according to the present embodiment in order to reduce a dimensional difference between the gate electrodes 58.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com