About: http://webisa.webdatacommons.org/9296650

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	An aspect of the present invention may provide for a method for modifying a photomask pattern optimized for use in producing a pattern on a workpiece, such as a semiconductor wafer, drive head, optical component or other objects.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es