About: http://webisa.webdatacommons.org/96474801

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	A method of reworking an EUV mask, having a substrate, a reflective layer including a capping layer for protecting the reflective layer from oxidation, and an absorbing layer, comprising etching the absorbing layer, wherein the etching
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com