About: http://webisa.webdatacommons.org/99075824

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention relates to a semiconductor device manufacturing method, in particular to a method of manufacturing a semiconductor device capable of reducing leak current in a device isolation region.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr