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An Entity of Type : prov:Entity, within Data Space : wifo5-40.informatik.uni-mannheim.de:8890 associated with source dataset(s)

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  • Furthermore, polycrystalline silicon 20 as the bit line is deposited and left in such a manner as to encompass the projecting portion as shown in FIG. 6R. The diffusion layer as the impurity area is formed by the diffusion of the impurity from this polycrystalline silicon.
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