| http://www.w3.org/ns/prov#value | - However, there is a problem in that a high-k dielectric material tends to generate an interface state, a fixed charge, etc., because generally a high-k dielectricmaterial does not have a good interface characteristic at an interface with a silicon substrate.Furthermore, a so-called metal silicate, which is a metal-added SiO.sub.2, is also being considered to be a material for gate dielectric film.
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