| http://www.w3.org/ns/prov#value | - To facilitate the etching of unmasked chromium, gold, and other metals capable of forming oxychloride derivatives on preselected portions of a substrate material, the material is exposed to a low pressure rf generated...http://www.google.com/patents/US3951709?utm_source=gb-gplus-sharePatent US3951709 - cold plasma etchingAdvanced Patent SearchPublication numberUS3951709 APublication typeGrantApp
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