About: http://webisa.webdatacommons.org/397405871

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	This appears to be the situation to date, irrespective of the fact that there is an economic reason to make the plasma source of the Etch/CVD chamber as small as possible, consistent with the requisite process uniformity.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com