PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • To attain the above objects, with a primary aspect of the present invention, provided is a developing processing apparatus for supplying a developing solution to a substrate to be processed on which a photoresist film has been formed to thereby perform developing processing, including: a substrate holding mechanism for horizontally holding the substrate to be processed; a developing solution suppl
http://www.w3.org/ns/prov#wasQuotedFrom
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