About: http://webisa.webdatacommons.org/21548500

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a method and apparatus that detects the endpoint of CMP processing at critical areas on the surface of a semiconductor wafer.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es