| http://www.w3.org/ns/prov#value | - In the above method, the copper anti-diffusion insulating film may be formed by covering materials such as methyl, benzochlorobutane, polyimide, arylether and hydrogen silsesquioxane, which contain Si, C and N in a type of a sol or gel, and then performing an annealing process in order to densify the covered film.
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