| http://www.w3.org/ns/prov#value | - Another aspect of the present invention is a method for forming a common ground for an electromechanical device, further comprising acts of: depositing a sacrificial layer, the sacrificial layer having a thickness; and etching a plurality of tooth regions into the sacrificial layer proximate a portion of the conducting layer, such that the tooth regions, in a final device, provide a reduced adhesi
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