| http://www.w3.org/ns/prov#value | - A higher substrate temperature is preferable, but when using glass, the temperature of the substrate itself should be within a range of from 300??? C. to 600??? C. considering the heat resistance of the material, and the most desirable polycrystalline silicon can be obtained under conditions including a film thickness within a range of from 30 to 200 nm, a laser irradiating energy within a range o
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