About: http://webisa.webdatacommons.org/362453890

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention is a planarizing machine and a method for reducing the number of residual particles on wafers or other substrates after CMP processing.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au