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Subject Item
isa:451362836
rdf:type
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prov:value
In a second step of the process of the present invention, defects such as waveguides, cavities, etc., are patterned in photoresist layer 12 using an electron beam 14 as shown in FIG. 1( c).
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n4:fr
Subject Item
isap:351043617
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isa:451362836