About: http://webisa.webdatacommons.org/119149877

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	By etching polysilicon with, for example, C2 F6 +O2 and by etching SiO2 with, for example CHF3, the second layer SL and the first layer SI are structured analogous to the second mask M2b (see FIG. 5).
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr