About: http://webisa.webdatacommons.org/223380048

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	20100152086Wet Clean Compositions for CoWP and Porous Dielectrics - The present invention is a formulation for wet clean removal of post etch and ash residue from a semiconductor substrate having a CoWP feature, comprising;
http://www.w3.org/ns/prov#wasQuotedFrom	faqs.org