| http://www.w3.org/ns/prov#value | - In a second form of the resist composition of the present invention, the base resin used as the major component (A) is a polymer of the following rational formula (2): ##STR5## wherein each of R1, R3 and R5 is a hydrogen atom or methyl group, R4 is a tert-butyl group, R6 is an acid hydrolyzable group selected from the group consisting of methoxymethyl, tetrahydro-pyranyl, trialkylsilyl, isopropoxy
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