| http://www.w3.org/ns/prov#value | - In order to form channel layers or wiring layers containing the carbon nanotubes to manufacture semiconductor devices such as FETs, the following procedure is usually used to form carbon nanotube patterns: (i) a procedure including a step of forming a catalyst layer containing a transition metal element for selectively growing carbon nanotubes on a wafer to pattern the catalyst layer and a step of
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