About: http://webisa.webdatacommons.org/288347072

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	With the dry etching employing XeF2, since plasma is not used, influence of damage or the like will not occur easily due to the area other than the area to where the concave portion 103 of the SOI substrate 307 is to be formed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com