About: http://webisa.webdatacommons.org/291148475

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	An insulating film including silicon is formed as the first interlayer insulating film 538 to have a thickness of 100 nm to 200 nm by a plasmaCVD method or a sputtering method.
http://www.w3.org/ns/prov#wasQuotedFrom	patentgenius.com