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http://webisa.webdatacommons.org/320414540
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Various kinds of films made of metal or metal oxide, such as Si, SiO2, W, WSi, WN, Ta, TaN, Ta2O5, BST, PZT, HfO3, La2O3, Pr2O3, RuO2, Al2O3, Ti and TiN, can be etched and removed, by appropriately selecting and mixing these gases.
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