| http://www.w3.org/ns/prov#value | - The insulating films 1302 and 1304 are formed using an insulating material such as silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiOxNy, where x>y), or silicon nitride oxide (SiNxOy, where x>y) by a CVD method, a sputtering method, or the like.
|
