| http://www.w3.org/ns/prov#value | - A method for manufacturing a sensor in a plate of monocrystalline silicon, comprising the steps of:forming a multilayer plate in which an etching layer is arranged between an upper layer and a lower layer, the upper and lower layers being made of monocrystalline silicon and the etching layer being made of an insulating material selected from the group including silicon oxide, silicon nitride, and
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