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http://webisa.webdatacommons.org/400621733
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
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However, since fluoride etchants normally etch materials such as silicon dioxide and polysilicon, for example, at the same rate, the etch has little selectivity for oxide rather than silicon.
http://www.w3.org/ns/prov#wasQuotedFrom
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