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About:
http://webisa.webdatacommons.org/401553027
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http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value
The present invention is particularly applicable to embodiments in which the thickness (n2) of the polysilicon layer is less than or equal to three times the thickness (n1) of the gate oxide region.
http://www.w3.org/ns/prov#wasQuotedFrom
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