| http://www.w3.org/ns/prov#value | - The insulating films 1302 and 1304 are formed using insulating materials such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy, where x>y), or silicon nitride oxide (SiNxOy, where x>y) by a CVD method, a sputtering method, or the like.
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