| http://www.w3.org/ns/prov#value | - The thin silicon nitride layer 17 thus covers, in the region of the trench walls 14 and of the trench bottom 15, the thin silicon dioxide layer 16 applied thereto and, in the region of the surface 11, the mask 12 arranged thereon. (e) Afterward, the trenches 13 are filled with a filling material, for example with silicon dioxide.
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