PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • A gate dielectric layer 9 is formed by depositing a certain insulating layer such as the oxide film or the nitride film on the semiconductor substrate 1 on which the device isolation regions 7 are formed.
http://www.w3.org/ns/prov#wasQuotedFrom
  • google.com