| http://www.w3.org/ns/prov#value | - A composition of precursors for the first silicon oxide layer may include silane (SiH4) at a flow rate of greater than about 2,000 sccm, such as between about 3,500 sccm and about 5,500 sccm, for example, about 4,500 sccm, and nitrous oxide (N2O) at a flow rate of greater than about 20,000 sccm or greater, such as between about 35,000 sccm and about 55,000 sccm, for example, about 45,000 sccm.
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