About: http://webisa.webdatacommons.org/95771018

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	As an example, one of the most serious problems concerned with conventional CVD of low resistivity metal films used in the sub-100 nm silicon IC fabrication is the rough surface morphology due to the presence of the large crystal grains.
http://www.w3.org/ns/prov#wasQuotedFrom	google.fr