| http://www.w3.org/ns/prov#value | - Control of the plasma oxidation is further obtained by applying ahigher RF power to the top portion of a plasma reactor while applying a lower RF value to the bottom portion of the plasma reactor.In yet another embodiment, the dielectric layer is one of hafnium oxide, hafnium silicate, aluminum oxide, zirconium oxide, and other metal oxides that contain one, two or even more cations and nanolamina
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