About: http://webisa.webdatacommons.org/138767907

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The silicon etchant used in the SCF-based etching composition of the present invention includes XeF2, which are particularly well suited for etching MEMS and other semiconductor devices.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com.au