About: http://webisa.webdatacommons.org/140704974

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Accordingly, a photosensitive mask material such as a resist may include an incompletely exposed region between a non-exposed region and a completely exposed region, and thereby the edge of an etching mask can have a tapered shape.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es