About: http://webisa.webdatacommons.org/147917307

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	This technique can be used on substrates of clean silicon, silicon carbide, glass, quartz, tantalum, titanium, tungsten and any other substrate which resists the chemical etching of the top metal layer 7.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com