| http://www.w3.org/ns/prov#value | - Accordingly, there is a need for an improved process for the production of sputtering targets comprising sub-stoichiometric TiO2 which does not involve the hot-pressing and sintering route of JP-A-07-233469 and which can be used to produce such targets which have a high enough electrical conductivity to be used as large size targets with complex shapes at high power levels.
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