| http://www.w3.org/ns/prov#value | - The insulating film 804 is formed of an insulating material such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy, x>y>0), silicon nitride oxide (SiNxOy, x>y>0), or the like, by a CVD method, a spattering method, or the like.
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