About: http://webisa.webdatacommons.org/176347956

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http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	SUMMARY OF THE INVENTION [0007] To achieve the foregoing and other objects and according to the purpose of the present invention, a method of etching deep openings in a silicon layer in a plasma etching reactor is disclosed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com