| http://www.w3.org/ns/prov#value | - Note that the gate insulating film 1906 is formed of a material such as silicon oxide, silicon nitride, silicon oxynitride (SiOxNy where x>y>0), or silicon nitride oxide (SiNxOy where x>y>0) by a CVD method, a sputtering method, or the like.
|
