About: http://webisa.webdatacommons.org/25133317

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	RCA cleaning is widely used to remove contaminants such as particles and metal impurities on a wafer in semiconductor manufacturing.
http://www.w3.org/ns/prov#wasQuotedFrom	sumitomo-chem.co.jp