| http://www.w3.org/ns/prov#value | - In the electron-emitting devices of the present invention, the holes are formed in the porous structure in the insulating layer such as the oxide film formed by anodic oxidation, at least the carbon deposit being the electron-emitting body is formed in the holes of the porous structure, and the gap is provided between the lower electrode and the upper electrode; therefore, with application of the
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