| http://www.w3.org/ns/prov#value | - In various embodiments, dielectric films can also be modified by e.g. (1) etching, which usually reduces the thickness of the film and/or modifies the roughness or structure of the semiconductor surface, (2) growing, which increases the thickness of an already existing film such as a silicon dioxide or silicon nitride film, (3) reflow, which is typically done with glass materials, such as BPSG, or
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